The application of polysilazane in coatings is based on its unique molecular structure and reaction properties. The main chain of its molecules is composed of alternating connections of silicon and nitrogen atoms. During the film formation process, through heating or catalytic reactions at room temperature, intermolecular cross-linking reactions occur, and nitrogen atoms and silicon atoms recombine to form a dense network structure. Eventually, it transforms into an inorganic coating mainly composed of silica or silicon-oxygen-nitrogen bonds, firmly adhering to the substrate surface.
As a coating material, polysilazane has many advantages. Firstly, it has excellent weather resistance and corrosion resistance. The formed inorganic coating can resist the erosion of ultraviolet rays, high temperatures, acids, and alkalis, effectively protecting the substrate. Secondly, it has good film-forming properties, and can form a uniform film on various substrates (such as metals, ceramics, plastics), with a dense and pore-free coating and strong adhesion. Thirdly, it has functional diversity. By adjusting the process or introducing functional groups, it can impart different properties such as high-temperature resistance, insulation, and anti-fouling to the coating, meeting the requirements of multiple fields such as electronics, automobiles, and aerospace. In addition, its curing process has low energy consumption, and some can be cured at room temperature, conforming to the trend of green production.